Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...

Design patterns have evolved to address problems that are often encountered in software applications. They are solutions to recurring problems and complexities in software design. We’ve discussed many ...

Retro design is experiencing a major comeback, infusing bold color and pattern with a modern twist. Instead of monochromatic ...

Retro design is experiencing a major comeback, infusing bold color and pattern with a modern twist. Instead of monochromatic designs or interiors without patterns, these days, graphics and playful ...