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Intel installs industry's first commercial high-NA EUV lithography tool — ASML Twinscan EXE:5200B sets the stage for 14A
B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.
Bernstein upgraded ASML to ‘Outperform’ and raised its price target on the stock to $1,528 from $935. ・The firm also ...
Taiwan Semiconductor Manufacturing Co (NYSE:TSM) and peer chipmakers are still evaluating ASML Holding’s (NASDAQ:ASML) advanced high numerical aperture (NA) machines for their advanced technology ...
Investing.com -- ASML shares rose on Monday after Bernstein upgraded the Dutch chipmaking equipment supplier to Outperform ...
ASML Holding (ASML) is aiming for about 30% year-over-year growth in extreme ultraviolet (EUV) revenues in 2025. ASML expects this growth to be driven by both an increase in Low Numerical Aperture (NA ...
Then at Intel's Foundry Direct event in April, Intel's chief technology and operations officer Naga Chandrasekaran stated ...
Intel recently confirmed the latest results in its partnership with ASML. The US chipmaker worked with engineers from the European corporation to install, test, and validate ...
China has built a prototype EUV (extreme ultraviolent) lithography machine in a high-security laboratory in Shenzhen. They ...
We are bullish on ASML Holding, reflecting robust capex-driven demand from top customers despite China headwinds. 2026 ...
A report states that Intel's 18A process node and production capacity could help it challenge Taiwan Semiconductor's lead in ...
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